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Please use this identifier to cite or link to this item: http://nbn-resolving.de/urn:nbn:de:hebis:34-2017011151880

Title: Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays
Other Titles: Entwicklung, Evaluierung und Optimierung von Herstellungsprozessen für mikrospiegelbasierte Lichtlenksysteme
Authors: Al-Qargholi, Basim
???metadata.dc.subject.swd???: SpiegelsystemArraySiliciumFotoleiter
???metadata.dc.subject.ddc???: 530 - Physik (Physics)
Issue Date: 11-Jan-2017
Abstract: In this work, fabrication processes for daylight guiding systems based on micromirror arrays are developed, evaluated and optimized.Two different approaches are used: At first, nanoimprint lithography is used to fabricate large area micromirrors by means of Substrate Conformal Imprint Lithography (SCIL).Secondly,a new lithography technique is developed using a novel bi-layered photomask to fabricate large area micromirror arrays. The experimental results showing a reproducible stable process, high yield, and is consuming less material, time, cost and effort.
URI: urn:nbn:de:hebis:34-2017011151880
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